E12900 - SEMI E129 - Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing Facility Revision:SEMI E129-0709 - Superseded Background and description of an

Background and description of an approach to understanding data quality and associated terminology

7-0698 (first published)

1  The scope of this Standard is grades of hydrofluoric acid used in the semiconductor industry

The scope of this Specification is for one grade of n-butyl acetate used in the semiconductor industry

This Test Method provides detailed procedures for characterizing silicon wafers GOI using the TZDB method

E12900 - SEMI E129 - Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing Facility Revision:SEMI E129-0709 - Superseded Background and description of anThe purpose of this Guide is to minimize the negative impact on productivity caused by static charge and electric fields in semiconductor manufacturing environments. It is a guide for establishing electrostatic compatibility in facilities used for semiconductor manufacturing. Electrostatic compatibility of production equipment is addressed in SEMI E78. Electrostatic surface charge causes a number of undesirable effects in semiconductor manufacturing