MF065700 - SEMI MF657 - Test Method for Measuring Warp and Total Thickness Variation on Silicon Wafers by Noncontact Scanning Revision:SEMI MF657-0707E (Withdrawn 0914) - Withdrawn The results should be reported

The results should be reported as within specification (below a certain value) or not in specification only (SEMI C1)

and coated transparent surfaces that may have been purposely modified (textured) to achieve desired reflective and/or transmissive properties

This Standard details select film definitions and specifications required for EUV Blanks

and provide reference for various characteristic features and contaminants that are seen on highly specular silicon wafers

FOUPは次の構成部分と付加構造よりなる（カッコ内は個数を示す）。

MF065700 - SEMI MF657 - Test Method for Measuring Warp and Total Thickness Variation on Silicon Wafers by Noncontact Scanning Revision:SEMI MF657-0707E (Withdrawn 0914) - Withdrawn The results should be reportedThis standard was technically approved by the global Silicon Wafer Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on April 25, 2007. It was available at www. semi. org in June 2007. Originally published by ASTM International as ASTM F 657 80; previously published July 2005. Warp and thickness variation of silicon wafers can significantly affect the yield of semiconductor device processing. Knowledge