P04100 - SEMI P41 - XMLによる，検査装置，修正装置およびレビュー装置間で取扱うマスク欠陥データ仕様 Revision:SEMI P41-0304E - Inactive The purpose of this Document

The purpose of this Document is to provide specification for carbon tetrafluoride (CF4) that is used in the semiconductor industry

orgで入手可能となる。初版は1997年発行。前版は2003年11月発行。

This Test Method is limited to specimens with optical surfaces that are flat or that are spherical with a radius of curvature greater than 10 m

terms used to describe the characteristics of the edge profile of silicon wafers are named and their meaning is illustrated by a schematic drawing

SEMI E142-0224E (editorial revision)

P04100 - SEMI P41 - XMLによる，検査装置，修正装置およびレビュー装置間で取扱うマスク欠陥データ仕様 Revision:SEMI P41-0304E - Inactive The purpose of this DocumentNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Global Micropatterning CommitteeJapanese Micropatterning Committee2009Japanese Regional Standards Committee20042www. semi. org20043 E 2004923 NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to