E09600 - SEMI E96 - Guide for CIM Framework Technical Architecture Revision:SEMI E96-1101 - Superseded Alternative methods may also be

Alternative methods may also be used as long as they comply with SEMI C1 requirements for method validation

and oxidizing gas

SEMI F48-0200 (first published)

Method B is nondestructive and suitable for inspection of all points on the wafer periphery except flats or notches

本方法可便于在世界各地实验室之间统一测试方案和测试结果，用于监测或测量硅粉中B

E09600 - SEMI E96 - Guide for CIM Framework Technical Architecture Revision:SEMI E96-1101 - Superseded Alternative methods may also beNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. This Guide describes technical architecture choices that enable application components to cooperate in a computer integrated manufacturing (CIM) environment and reduce the effort required to integrate those components into