MF152900 - SEMI MF1529 - Test Method for Sheet Resistance Uniformity Evaluation by In-Line Four-Point Probe with the Dual-Configuration Procedure Revision:SEMI MF1529-1110 - Superseded 3 Both test methods covered

3  Both test methods covered by this standard are applicable to all types of measured edge profiles on silicon wafers

liquid crystal display [LCD]) is necessary

b and hue a*

The purpose of this Document is to provide a guide for a grade of 25% tetramethylammonium hydroxide for which a need has been identified

SEMI E89等で網羅しており，統計的な考察を議論することは行わない。

MF152900 - SEMI MF1529 - Test Method for Sheet Resistance Uniformity Evaluation by In-Line Four-Point Probe with the Dual-Configuration Procedure Revision:SEMI MF1529-1110 - Superseded 3 Both test methods coveredThe sheet resistance of epitaxial, implanted, diffused or deposited films is an important materials acceptance and process control parameter. The uniformity across a wafer of the sheet resistance resulting from any of these processes is important for the equivalence of performance of devices or circuits made from various regions of the wafer. This Test Method uses a four point probe in a manner different from that of other ASTM methods for the