P00300 - SEMI P3 - Specification for Photoresist/E-Beam Resist for Hard Surface Photoplates Revision:SEMI P3-0308 - Inactive SEMI E154 — Mechanical Interface

SEMI E154 — Mechanical Interface Specification for 450mm Load Port

This Document covers requirements for bulk silane (SiH4) used in the semiconductor industry

provides an indication of the native nucleation sites present in the as-received wafers

00 (Contact Michelle Fabiano at mfabiano@semi

would report the same data

P00300 - SEMI P3 - Specification for Photoresist/E-Beam Resist for Hard Surface Photoplates Revision:SEMI P3-0308 - Inactive SEMI E154 — Mechanical InterfaceNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. NOTICE: This Document was completely rewritten in 2008. This Specification covers the general requirements on the photoresist and e beam resist coating for hard surface photoplates. See SEMI P1 and SEMI P2 for requirements