D05500 - SEMI D55 - Guide for Evaluation Method of Color Performance for Color Filter Assemblies (Evaluation Method of Color Purity) Revision:SEMI D55-0310 - Inactive Where there is not significant

Where there is not significant compensation by impurities of the opposite conductivity type

This edition was approved for publication by the global Audits and Reviews Subcommittee on August 31

Nanotopography on a wafer surface prior to CMP processes can result in variations in post-CMP dielectric thickness with potential negative consequences for circuit performance and yield

they must be implemented as identified in this Standard

This procedure applies to face-seal

D05500 - SEMI D55 - Guide for Evaluation Method of Color Performance for Color Filter Assemblies (Evaluation Method of Color Purity) Revision:SEMI D55-0310 - Inactive Where there is not significantThis Standard was technically approved by the Flat Panel Display Color Filter & Optical Elements Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 16, 2010. Available at www. semi. org in March 2010. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are