E18000 - SEMI E180 - 通过ICP-MS测量半导体晶圆加工过程中关键腔室部件表面金属污染的试验方法 StdPbc-1115 It has been replaced by

It has been replaced by SEMI F119

This Standard applies to two-port/four-fastener components (except mass flow controllers and mass flow meters)

2  This Guide applies in particular to glass and silicon wafers with a diameter equal to or exceeding 300 mm and their thickness equal to or less than 775 µm ± 20 µm

technicians or any individual working directly with this equipment or product

top tool vendors

E18000 - SEMI E180 - 通过ICP-MS测量半导体晶圆加工过程中关键腔室部件表面金属污染的试验方法 StdPbc-1115 It has been replaced byNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. ICP MSCCCsCCC CCC CCC ICP MSCCCs CCC AlNaKCaLiFeCuNiCrCoTiMgZn