P03700 - SEMI P37 - Specification for Extreme Ultraviolet Lithography Substrates and Blanks StdTpc-300 mm Carriers & Physical Interfaces SEMI E70-0298 (first published)

SEMI E70-0298 (first published)

within the limits of the measurement equipment precision

Two test methods are covered by this Standard

terms used to describe the characteristics of the edge profile of silicon wafers are named and their meaning is illustrated by a schematic drawing

SEMI MF1528-94 (Reapproved 1999) (first SEMI publication)

P03700 - SEMI P37 - Specification for Extreme Ultraviolet Lithography Substrates and Blanks StdTpc-300 mm Carriers & Physical Interfaces SEMI E70-0298 (first published)This Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 1, 2013. Available at www. semiviews. org and www. semi. org in June 2013; originally published November 2001; previously published November 2009. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not