M07600 - SEMI M76 - 開発用直径450 mmシリコン単結晶鏡面ウェーハの仕様 Revision:SEMI M76-0710 - Inactive org September 1998

org September 1998

採用された方法が彼等の期待を満足させるために品質レベルを認め，相互に合意することは，供給者およびその顧客にとり重要である。統計的仕様は，これを行う便利な方法を提供する。

SEMI MF1727 defines the procedures for oxidation of the wafer prior to etching

Application of this Test Method is expected to yield comparable data among filters or gas systems

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M07600 - SEMI M76 - 開発用直径450 mmシリコン単結晶鏡面ウェーハの仕様 Revision:SEMI M76-0710 - Inactive org September 1998NOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI global Silicon Wafer Committee2010430global Audits and Reviews Subcommittee20106www. semi. org 450 mmIC450 mm 450 mm 450 mmAMHS450 mm450 mmSEMI M74 SI (System International Referenced SEMI Standards SEMI E45 Test Method for the