T01400 - SEMI T14 - Specification for Micro ID on 300 mm Silicon Wafers StdVol-Microlithography SEMI D21 — Terminology for

SEMI D21 — Terminology for FPD Mask Pattern Accuracy

Non-Member      $1395  $1295

1-0306 (technical revision)

1-1104 - replaced by SEMI E137

These mounting requirements may be used in other tools used to fabricate or measure EUV masks

T01400 - SEMI T14 - Specification for Micro ID on 300 mm Silicon Wafers StdVol-Microlithography SEMI D21 — Terminology forThis specification was technically approved by the global Traceability Committee and is the direct responsibility of the Japanese Traceability Committee. Current edition approved by the Japanese Regional Standards Committee on July 23, 2004. Initially available at www. semi. org September 2004; to be published November 2004. NOTICE: The designation number of T14 was updated during the 0705 cycle to reflect the creation of T14. 1. The purpose of this