P03900 - SEMI P39 - OASISTM – オープン・アートワーク・システム・インターチェンジ・スタンダード（OPEN ARTWORK SYSTEM INTERCHANGE STANDARD） Revision:SEMI P39-0308 - Superseded including leading IDM

including leading IDM

This Guide represents the range of conditions in which equipment should be capable of operating

Define and develop lithography alignment strategy for C2C

but leaves the implementation options open

This edition was approved for publication by the global Audits and Reviews Subcommittee on May 13

P03900 - SEMI P39 - OASISTM – オープン・アートワーク・システム・インターチェンジ・スタンダード（OPEN ARTWORK SYSTEM INTERCHANGE STANDARD） Revision:SEMI P39-0308 - Superseded including leading IDMglobal Micropatterning Committee2008118global Audits and Reviews Subcommittee20082www. semi. org20083CD ROM20043200511 2001SEMIData Path Task ForceGDSIIGDSIIIC201632 GDSII1 163264 SEMI Data Path Task ForceInternational SematechEDASematech Referenced SEMI Standards None.