Titanium (Ti) Metallic Substrate: 10x5x0.5 mm, 1side polished - mcTi100505S1 Accessories Output : Removal of impurities

Output : Removal of impurities to < 1 ppm   ( O2

Material:                                 Natural ABS With ESD Coating

Nominal Thickness            350+/- 25 microns

Silicon Thickness: 0

Growing Method:              CZ

Titanium (Ti) Metallic Substrate: 10x5x0.5 mm, 1side polished - mcTi100505S1 Accessories Output : Removal of impuritiesPolycrystal Ti metallic substrate Purity: > 99. 9% Size: 10x5x0. 5 mm Surface finish: One side polished < 30A by AFM within a 5x5 micron area Application: substrates for metal, alloy film, and biological materials Related Product Metallic Substrate A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater